Semiconductor wafer fabrication furnace idle monitor and...

Details Semiconductor wafer fabrication furnace idle monitor and... Semiconductor wafer fabrication furnace idle monitor and...

2006-05-09

2006-05-09

Picard, Leo (Department: 2125)

Data processing: generic control systems or specific application

Specific application, apparatus or process

Product assembly or manufacturing

C700S121000, C700S306000

Reexamination Certificate

active

07043317

ABSTRACT:
A system and method is disclosed for monitoring each of a plurality of furnaces in a furnace process in semiconductor wafer fabrication. A furnace that is left open too long will absorb moisture from the atmosphere and should not be used for a furnace task. The system of the invention comprises a furnace resource allocator that comprises a furnace idle timer unit that keeps track of how long each furnace has been open. If the idle time for a selected furnace exceeds a predetermined limit, that furnace is rejected and another furnace is selected for use. Each furnace that is rejected is subjected to a furnace cycle purge process to remove moisture from the furnace so that the furnace may again be available for use.

REFERENCES:
patent: 3858548 (1975-01-01), Tick
patent: 6957114 (2005-10-01), Logsdon et al.
patent: 6959225 (2005-10-01), Logsdon et al.
patent: 2003/0171972 (2003-09-01), Heskin
patent: 2004/0243268 (2004-12-01), Hsieh et al.

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