Semiconductor wafer dividing method utilizing laser beam

Semiconductor device manufacturing: process – Making device or circuit emissive of nonelectrical signal – Substrate dicing

Reexamination Certificate

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C438S068000, C438S111000, C438S113000, C438S114000, C438S120000, C438S461000, C438S462000, C438S463000, C438S464000, C438S465000, C438S460000, C438S458000

Reexamination Certificate

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07141443

ABSTRACT:
A method which can divide a semiconductor wafer sufficiently precisely along a street by use of a laser beam, while fully avoiding or suppressing contamination of circuits formed in rectangular regions on the face of the semiconductor water, and without causing chipping to the rectangular regions on the face. A laser beam is applied from beside one of the back and the face of a semiconductor substrate and focused onto the other of the back and the face of the semiconductor substrate, or the vicinity thereof, to partially deteriorate at least a zone ranging from the other of the back and the face of the semiconductor substrate to a predetermined depth.

REFERENCES:
patent: 3112850 (1963-12-01), Garibotti
patent: 5826772 (1998-10-01), Ariglio et al.
patent: 6211488 (2001-04-01), Hoekstra et al.
patent: 6236446 (2001-05-01), Izumi et al.
patent: 6562698 (2003-05-01), Manor
patent: 2003/0017663 (2003-01-01), Takyu et al.
patent: 1 160 853 (2001-12-01), None
patent: 2001-277163 (2001-10-01), None
patent: 2003-151921 (2003-05-01), None
Austrian Patent Office Search Report via IPOS (Singapore).
Austrian Patent Office Examination Report via IPOS (Singapore).

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