Semiconductor wafer cleaning system

Details Semiconductor wafer cleaning system Semiconductor wafer cleaning system

1997-08-07

1999-06-01

El-Arini, Zeinab

Cleaning and liquid contact with solids

Processes

Including application of electrical radiant or wave energy...

134 2, 134 3, 134 26, 134 28, 134 34, 134 41, 134902, B08B 308, B08B 312, B08B 702, C23G 102

Patent

active

059085096

ABSTRACT:
Semiconductor wafers are positioned in a cleaning tank and subjected to sequential flows of one or more highly diluted cleaning solutions that are injected from the lower end of the tank and allowed to overflow at the upper end. One solution comprises one part ammonium hydroxide, two parts hydrogen peroxide, and 300-600 parts deionized water together with a trace of high purity surfactant. Rinsing water is flowed through the tank after the first solution is dumped. A second solution comprises highly dilute hydrofluoric acid. A third solution is more dilute than the first solution. A fourth solution contains hydrochloric acid greatly diluted with deionized water. The cleaning tank is provided with a megasonic generator in its lower portion for selective application of megasonic energy. Quick dump valves in the tank bottom enable the solutions to be quickly dumped followed by one or more rinse steps, including a quick refill while spraying and then dumping of the rinsing water.

REFERENCES:
patent: 2961354 (1960-11-01), Cleveland
patent: 3690333 (1972-09-01), Kierner
patent: 3893869 (1975-07-01), Mayer et al.
patent: 4193818 (1980-03-01), Young et al.
patent: 4409999 (1983-10-01), Pediziwiatr
patent: 4577650 (1986-03-01), McConnell
patent: 4633893 (1987-01-01), McConnell et al.
patent: 4652334 (1987-03-01), Jain et al.
patent: 4736760 (1988-04-01), Coberly et al.
patent: 4738272 (1988-04-01), McConnell
patent: 4740249 (1988-04-01), McConnell
patent: 4778532 (1988-10-01), McConnell et al.
patent: 4795497 (1989-01-01), McConnell et al.
patent: 4856544 (1989-08-01), McConnell
patent: 4899767 (1990-02-01), McConnell et al.
patent: 4911761 (1990-03-01), McConnell et al.
patent: 4917123 (1990-04-01), McConnell et al.
patent: 4984597 (1991-01-01), McConnell et al.
patent: 5078801 (1992-01-01), Malik
patent: 5100476 (1992-03-01), Mase et al.
patent: 5143103 (1992-09-01), Basso et al.
patent: 5302311 (1994-04-01), Sugihara et al.
patent: 5308400 (1994-05-01), Chen
patent: 5320706 (1994-06-01), Blackwell
patent: 5456759 (1995-10-01), Stanford, Jr. et al.
patent: 5656097 (1997-08-01), Olesen et al.
patent: 5704987 (1998-01-01), Huynh et al.
patent: 5709755 (1998-01-01), Kuo et al.
Copy of an article by Werner Kern, entitled "The Evolution of Silicon Water Cleaning Technology", J. Electrochem. Soc., vol. 137, No. 6, Jun. 1990.
Copy of an article by S. Verhaverbeke, et al., entitled "Advanced Wet Cleaning Technology For Highly Reliable Thin Oxides", Nov. 1993.
Copy of an article by Peter H. Singer, entitled "Trends in Wafer Cleaning", Semiconductor International, Dec. 1992.

Affiliated with

Also associated with

Rating

Semiconductor wafer cleaning system does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Semiconductor wafer cleaning system, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Semiconductor wafer cleaning system will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-952594