Cleaning compositions for solid surfaces – auxiliary compositions – Cleaning compositions or processes of preparing – For cleaning a specific substrate or removing a specific...
Patent
1995-07-31
1998-06-02
McGinty, Douglas J.
Cleaning compositions for solid surfaces, auxiliary compositions
Cleaning compositions or processes of preparing
For cleaning a specific substrate or removing a specific...
134 3, C11D 708, C11D 718, B08B 308
Patent
active
057599718
ABSTRACT:
A semiconductor wafer cleaning liquid includes an aqueous hydrogen fluoride (HF) solution having a HF concentration between 0.03% and 0.05% by weight, which is adjusted to 20.degree. C. or below and into which ozone is directly dissolved up to a saturation point. A method for cleaning semiconductor wafers incudes the steps of charging an aqueous HF solution adjusted to 20.degree. C. or below and having an HF concentration between 0.03% and 0.05% by weight into a treatment bath; dissolving ozone into the aqueous solution up to a saturation point to prepare a cleaning liquid; dipping to etch semiconductor substrate into the cleaning liquid in the treatment bath; and rinsing the semiconductor substrate with pure or ozone-dissolved water in a bath separate from the treatment bath.
REFERENCES:
patent: 5180469 (1993-01-01), Abe
patent: 5261966 (1993-11-01), Mashimo et al.
patent: 5423944 (1995-06-01), Wong
patent: 5489557 (1996-02-01), Jolley
patent: 5494849 (1996-02-01), Iyer et al.
patent: 5516730 (1996-05-01), Saeed et al.
patent: 5567244 (1996-10-01), Lee et al.
patent: 5589422 (1996-12-01), Bhat
patent: 5601656 (1997-02-01), Li
patent: 5603849 (1997-02-01), Li
patent: 5626681 (1997-05-01), Nakano et al.
patent: 5665168 (1997-09-01), Nakano et al.
Donohue, J.A., et al., "Gas Chromatographic Determination of Ozone and Other Products from the Electrolysis of Wet Hydrogen Fluoride", Analytical Chemistry, 38(13), 1858-1860, Dec. 1966.
Wong, M., et al., "Silicon Etch Using Vapor Phas HF/H2O and O3", Journal of the Electrochemical Society, 140(2), 567-570, Feb. 1993.
Foller, Peter C., et al., "The Anodic Evolution of Ozone", Journal of the Electrochemical Society, 129(3), 506-515, Mar. 1992.
Kirk-Othmer, Encyclopedia of Chemical Technology, 3rd ed., vol. 10, pp. 733-753. (Month unknown.), 1980.
McGinty Douglas J.
Sumitomo Sitix Corporation
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