Semiconductor wafer cleaning apparatus

Details Semiconductor wafer cleaning apparatus Semiconductor wafer cleaning apparatus

1997-12-09

1999-03-23

Stinson, Frankie L.

Cleaning and liquid contact with solids

Processes

Including application of electrical radiant or wave energy...

134 254, 134902, 134186, 134155, B08B 310

Patent

active

058853600

ABSTRACT:
A semiconductor wafer cleaning apparatus includes an internal cleaning tank having an inlet for introducing and an outlet for removing a cleaning solution, and an external cleaning tank surrounding the internal cleaning tank and having a plurality of inlets and outlets for introducing and removing the cleaning solution. First and second circulation pumps each disposed in the middle of the first and second circulation pipes for connecting the inlet and outlet of the internal cleaning tank with the plurality of inlets and outlets of the external cleaning tank are also provided. A baffle plate may also be disposed within the internal cleaning tank for fixing and separating a cassette having a plurality of wafers contained therein from the bottom of internal cleaning tank. A weight detector is preferably disposed on the baffle plate for detecting a weight heavier than a predetermined reference due to the pressing of the cassette, and a controller for controlling the first and second circulation pumps controls the cleaning operation in response to a detection signal from the weight detector. The semiconductor wafer cleaning apparatus can enhance the cleaning effect by efficiently removing contamination generated during a cleaning process.

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