Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
Patent
1995-05-23
1998-03-31
Breneman, R. Bruce
Chemistry: electrical and wave energy
Apparatus
Coating, forming or etching by sputtering
118728, 118500, 118503, 156345, 269 97, 269254R, 269254CS, 269289R, 269317, 269903, C23C 1450, B05C 1302
Patent
active
057334269
ABSTRACT:
Semiconductor wafer clamp device includes at least one clamp apparatus, the clamp apparatus including a removable clamp finger coupled to a connecting block by a connector. The device allows access to clamp apparatus from a top surface of a substrate holder, eliminating the need to remove the substrate holder in order to perform maintenance or repair operations on clamp apparatus. Tempered springs in the clamp apparatus reduce resilience losses experienced with non-tempered springs. Plastic clamp shaft bushings and spring retainers extend the useful life of clamp apparatus components by eliminating wear caused by metal-to-metal contact of moving parts.
REFERENCES:
patent: 4522697 (1985-06-01), Dimock et al.
patent: 5478399 (1995-12-01), Willard
Figures 1,2,3 and description on pp. 3-6 of patent application.
Figure 1 and accompanying description on pp. 3-4 of patent application.
Figure 2 and accompanying description on p. 4 of patent application.
Figure 3 and accompanying description on pp. 4-6 of patent application.
Bell David G.
Cox Arthur L.
Reinbold Mark S.
Advanced Micro Devices , Inc.
Breneman R. Bruce
McDonald Rodney G.
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