Semiconductor wafer carrier stage for chemical mechanical polish

Details Semiconductor wafer carrier stage for chemical mechanical polish Semiconductor wafer carrier stage for chemical mechanical polish

1999-04-19

2000-08-15

Eley, Timothy V.

Abrading

Work holder

Vacuum

451288, 451289, B24B 4700

Patent

active

06102788&

ABSTRACT:
A stage is provided with pressing holes arranged circumferentially and suctioning holes arranged circumferentially to be close to the outer peripheral edge side compared to the pressing holes. A cavity connected to these pressing holes and suctioning holes is provided within a wafer holder. In addition, first filters, which allow a gas to flow from the cavity side to the wafer holding surface side, are arranged between the pressing holes and the cavity. Second filters, which allow a gas to flow only from the wafer holding surface side to the cavity side, are arranged between the suctioning holes and the cavity.

REFERENCES:
patent: 3004766 (1961-10-01), Bryant
patent: 5423558 (1995-06-01), Koeth et al.
patent: 5651724 (1997-07-01), Kimura et al.
patent: 5762539 (1998-06-01), Nakashiba et al.
patent: 5797789 (1998-08-01), Tanaka et al.
patent: 5931725 (1999-08-01), Inaba et al.
patent: 5938512 (1999-08-01), Takei et al.

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