Semiconductor wafer carrier guide tracks

Details Semiconductor wafer carrier guide tracks Semiconductor wafer carrier guide tracks

1988-12-20

1990-07-17

Bueker, Richard

Coating apparatus

Gas or vapor deposition

118500, 118729, 118733, C23C 1600

Patent

active

049414291

ABSTRACT:
A track system is used in a continuous chemical deposition reaction system to guide semiconductor wafer carriers through a plurality of interconnected reaction chambers to position the carriers in each reaction chamber, and to prevent wear to the bottom of the reactor chambers.

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