Semiconductor vapor phase growing apparatus

Details Semiconductor vapor phase growing apparatus Semiconductor vapor phase growing apparatus

1983-03-04

1991-01-08

Smith, John D.

Coating apparatus

Control means responsive to a randomly occurring sensed...

Temperature responsive

118697, 118715, 118730, C23C 1308

Patent

active

049826930

ABSTRACT:
In a semiconductor vapor phase growing apparatus wherein a semiconductor wafer is heated in a reaction furnace, and an output of a source for heating, the temperature of the wafer, and flow quantities of gases supplied to the reaction furnace for vapor phase growing a semiconductor on the wafer by a chemical reaction of the gases are controlled by a control unit according to a predetermined sequences, there are provided a temperature detector for detecting the temperature of the wafer and output control means controlling the output of the source according to a given reference value. The control unit is consitituted by memory means storing a program of executing the sequences and linearly raising and lowering the wafer temperature at a predetermined temperature gradient in a plurality of divided time lateral units by making different the rates of temperature change in respective time interval units, and a CPU for processing the program.

REFERENCES:
patent: 2599478 (1952-06-01), Peters et al.
patent: 2916593 (1959-12-01), Herrick
patent: 3171755 (1965-03-01), Reuschel et al.
patent: 4031851 (1977-06-01), Camahort
patent: 4396640 (1983-08-01), Rocheleau et al.
patent: 4430959 (1984-02-01), Ebata et al.

Affiliated with

Also associated with

Rating

Semiconductor vapor phase growing apparatus does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Semiconductor vapor phase growing apparatus, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Semiconductor vapor phase growing apparatus will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-928221