Semiconductor vapor phase growing apparatus

Details Semiconductor vapor phase growing apparatus Semiconductor vapor phase growing apparatus

1987-02-03

1988-09-13

Bueker, Richard

Coating apparatus

Control means responsive to a randomly occurring sensed...

Responsive to attribute, absence or presence of work

118687, 118696, 118697, 118698, 118715, 118704, 118729, 118730, 118503, 118500, 901 2, 901 6, 414730, 414750, 414136, 414222, 414225, 414287, C23C 1600

Patent

active

047701218

ABSTRACT:
An apparatus for positioning a plurality of semiconductor substrates on a movable, support in a desired pattern, in a semiconductor vapor phase growing apparatus. A memory is provided for storing two dimensional data corresponding to the desired pattern. The desired pattern is predetermined by the sizes of the substrates and the space available on the flat support. A loading/unloading device loads and unloads the substrates on the support at positions corresponding to the two-dimensional data read from the memory. A positioning device positions the support so that the substrates can be loaded and unloaded at the predetermined positions. A control device synchronizes the movement of the loading/unloading device and the positioning device in accordance with the selected position so that the substrates are loaded and unloaded on the flat support in the desired pattern.

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patent: 4293249 (1981-10-01), Whelan
patent: 4386578 (1983-06-01), Haslund
patent: 4433951 (1984-02-01), Koch

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