Semiconductor treatment apparatus

Details Semiconductor treatment apparatus Semiconductor treatment apparatus

1993-12-03

1995-03-07

Jones, W. Gary

Coating apparatus

With means to centrifuge work

118 56, 118409, 118421, 118500, B05C 1100

Patent

active

053954467

ABSTRACT:
A semiconductor treatment apparatus has a gas-phase decomposing device for decomposing a gas-phase on a surface of a semiconductor substrate, a substrate supporting device for supporting the substrate, and a substrate transfer device for transferring the substrate between the gas-phase decomposing device and the substrate supporting device. The apparatus further has a liquid-drop applicator for applying a liquid-drop on the surface of the substrate supported by the substrate supporting device, with the liquid-drop being brought into contact with the surface of the substrate, and a liquid-drop preserving device for preserving the liquid-drop that has been applied to the surface of the substrate.

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