Semiconductor thin film, method for manufacturing the same,...

Compositions – Electrically conductive or emissive compositions – Metal compound containing

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C252S520100, C252S519100, C252S519330, C257S043000, C257S057000, C257S059000, C257SE29080, C257SE21459, C438S104000, C977S773000

Reexamination Certificate

active

07998372

ABSTRACT:
Disclosed is a semiconductor thin film which can be formed at a relatively low temperature even on a flexible resin substrate. Since the semiconductor thin film is stable to visible light and has high device characteristics such as transistor characteristics, in the case where the semiconductor thin film is used as a switching device for driving a display, even when overlapped with a pixel part, the luminance of a display panel does not deteriorate. Specifically, a transparent semiconductor thin film40is produced by forming an amorphous film containing zinc oxide and indium oxide and then oxidizing the film so that the resulting film has a carrier density of 10+17cm−3or less, a Hall mobility of 2 cm2/V·sec or higher, and an energy band gap of 2.4 EV or more.

REFERENCES:
patent: 6669830 (2003-12-01), Inoue et al.
patent: 2003/0037843 (2003-02-01), Hishida
patent: 2008/0017854 (2008-01-01), Marks et al.
patent: 2009/0090914 (2009-04-01), Yano et al.
patent: 2010/0051938 (2010-03-01), Hayashi et al.
patent: 2010/0140599 (2010-06-01), Yano et al.
patent: 2010/0140609 (2010-06-01), Yano et al.
patent: 2010/0155717 (2010-06-01), Yano et al.
patent: 1379827 (2002-11-01), None
patent: 2003-016858 (2003-01-01), None
patent: 2003016858 (2003-01-01), None
patent: 2003-086808 (2003-03-01), None
patent: 2003-100152 (2003-04-01), None
patent: 2004-273614 (2004-09-01), None
patent: WO-2004 034449 (2004-04-01), None
patent: WO 2004105054 (2004-12-01), None
patent: PCT/JP2006/322808 (2007-02-01), None
International Search Report completed Feb. 8, 2007 for International Patent Application No. PCT/JP2006/322808 filed Nov. 16, 2006.
Akihiro Takagi et al., “Carrier Transport and Electronic Structure in Amorphous Oxide Semiconductor, a-InGaZnO4,” Thin Solid Films, Aug. 2005, vol. 486 Nos. 1-2, pp. 38-41.
Matthew P. Taylor et al., “The Electrical, Optical, and Structural Properties of InxZn1-x0y(0<x<1) Thin Films by Combinatorial Techniques, ”Meas. Sci. Technol., Jan. 2005, vol. 16 No. 1, pp. 90-94.
Takagi, A. et al. “Carrier Transport and Electronic Structure in Amorphous Oxide Semiconductor, A-InGaZn04,” Thin Solid Films, Aug. 2005, pp. 38-41, vol. 486 Nos. 1-2.
Taylor, M.P. et al. “The Electrical, Optical and Structural Properties of InxZn1-xOy Thin Films by Combinatorial Techniques,” Meas. Sci. Technol., Jan. 2005, vol. 16 No. 1, pp. 90-94.
Office Action for Chinese Patent Application No. 200680042998 issued Jun. 29, 2010.
English Translation of Office Action for Chinese Patent Application No. 200680042998 issued Jun. 29, 2010.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Semiconductor thin film, method for manufacturing the same,... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Semiconductor thin film, method for manufacturing the same,..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Semiconductor thin film, method for manufacturing the same,... will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-2722611

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.