Semiconductor thin film and process for producing the same

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Reexamination Certificate

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C428S697000, C428S699000, C428S701000, C204S192250

Reexamination Certificate

active

08062777

ABSTRACT:
This invention provides a transparent oxide semiconductor, which comprises an oxide comprising indium oxide as a main component and cerium oxide as an additive and has such properties that light-derived malfunction does not occur, there is no variation in specific resistance of a thin film caused by heating and the like, and the mobility is high, and a process for producing the same. A semiconductor thin film characterized by comprising indium oxide and cerium oxide and being crystalline and having a specific resistance of 10+1to 10+8Ωcm is used. This semiconductor thin film has no significant change in specific resistance and has high mobility. Accordingly, an element having improved switching properties can be provided by constructing a switching element using this semiconductor thin film.

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Office Action from China Patent Office dated Oct. 9, 2009.
Tanaka, Shinchiro, et. al, Characterization of sensor using doped, Journal of Materials Research, May 2001, pp. 1289-1935, vol. 16 No. 5, Japan.

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