Active solid-state devices (e.g. – transistors – solid-state diode – With specified impurity concentration gradient – Stepped profile
Reexamination Certificate
2011-01-25
2011-01-25
Cao, Phat X (Department: 2814)
Active solid-state devices (e.g., transistors, solid-state diode
With specified impurity concentration gradient
Stepped profile
C257S185000, C257S655000, C257SE33003, C257SE21002
Reexamination Certificate
active
07875961
ABSTRACT:
A semiconductor substrate, of GaAs with a semiconductor layer sequence applied on top of the substrate. The semiconductor layer sequence comprises a plurality of semiconductor layers of Al1-yGayAs1-xPxwith 0≦x≦1 and 0≦y≦1. A number of the semiconductor layers respectively comprising a phosphorus component x which is greater than in a neighboring semiconductor layer lying thereunder in the direction of growth of the semiconductor layer sequence. Two semiconductor layers directly preceding the uppermost semiconductor layer of the semiconductor layer sequence have a smaller lattice constant than the uppermost layer.
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Grönninger Günther
Heidborn Peter
Kugler Siegmar
Linder Norbert
Streubel Klaus
Cao Phat X
Cohen Pontani Lieberman & Pavane LLP
Garrity Diana C
Osram Opto Semiconductors GmbH
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