Semiconductor substrate cleansing apparatus

Details Semiconductor substrate cleansing apparatus Semiconductor substrate cleansing apparatus

2007-05-15

2007-05-15

Stinson, Frankie L. (Department: 1746)

Cleaning and liquid contact with solids

Apparatus

With movable means to cause fluid motion

C134S200000, C134S902000

Reexamination Certificate

active

10451955

ABSTRACT:
A cleansing apparatus comprising: a table3for supporting a semiconductor substrate30horizontally; a high frequency solution injector20capable of injecting a solution to the upper surface30a and the side surface30c of the semiconductor substrate30supported by the table3with the application of vibration at high frequency; a cover2capable of tightly enclosing the semiconductor substrate30supported by the table3; and pressure reducing means18for reducing the pressure in a space, in which the semiconductor substrate30is enclosed with the cover2. The semiconductor substrate can be cleansed efficiently at a low cost and kept in clean state after the cleansing until it is dried.

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