Semiconductor device manufacturing: process – Semiconductor substrate dicing – By electromagnetic irradiation
Reexamination Certificate
2006-03-07
2006-03-07
Pert, Evan (Department: 2826)
Semiconductor device manufacturing: process
Semiconductor substrate dicing
By electromagnetic irradiation
C257S620000
Reexamination Certificate
active
07008861
ABSTRACT:
A method for forming semiconductor devices using a semiconductor substrate having first and second opposed surfaces and including first and second device regions includes directing a beam of laser light at the substrate such that the beam of laser light is focused within the substrate between the first and second surfaces thereof and the beam of laser light forms a thermally weakened zone (TWZ) in the substrate. The TWZ extends between the first and second device regions and defines a break line.
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Andrews Peter
Brown Elbert
Negley Gerald H.
Cree Inc.
Myers Bigel Sibley & Sajovec P.A.
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