Semiconductor structure and fabricating method thereof

Active solid-state devices (e.g. – transistors – solid-state diode – Physical configuration of semiconductor – With peripheral feature due to separation of smaller...

Reexamination Certificate

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C257S644000, C257S650000, C257S762000, C257SE23194, C438S113000, C438S114000, C438S458000, C438S462000

Reexamination Certificate

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11162863

ABSTRACT:
A semiconductor structure is provided. The semiconductor structure is disposed on the scribe line of a wafer and is around the chip area of the wafer. The semiconductor structure includes a plurality of dielectric layers sequentially disposed on the scribe line and a plurality of metal patterns disposed in each dielectric layer. The metal patterns disposed in each dielectric layer extend to the next underlying dielectric layer.

REFERENCES:
patent: 5831330 (1998-11-01), Chang
patent: 6734090 (2004-05-01), Agarwala et al.
patent: 6841455 (2005-01-01), West et al.
patent: 6951801 (2005-10-01), Pozder et al.
patent: 2004/0147097 (2004-07-01), Pozder et al.
patent: 2004/0164418 (2004-08-01), Sugiura et al.
patent: 2006/0022195 (2006-02-01), Wang

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