Semiconductor spin coating method

Details Semiconductor spin coating method Semiconductor spin coating method

1984-09-25

1987-02-03

Smith, John D.

Coating processes

Electrical product produced

Condenser or capacitor

118 52, 118 53, 118 54, 427240, B05D 512, H01L 21312

Patent

active

046408460

ABSTRACT:
An improved method for coating a semiconductor wafer with a uniform layer of photoresist or other liquid film is provided. The liquid is first semi-uniformly deposited on the wafer by spraying or otherwise. Thereafter, the wafer is rotated about an axis perpendicular to the plane of the wafer and removed from the wafer. In the preferred embodiment, a number of wafers are placed about the perimeter of a large, flat disc which is rotated about its center. The liquid is spread over the surface of each wafer by the centrifugal force generated by such rotation. By placing the wafers at a distance from the axis of rotation, the centrifugal force on all points of each wafer is approximately the same, thereby providing for a uniform spreading of the film over the wafer.

REFERENCES:
patent: 3436259 (1969-04-01), Regh et al.
patent: 3475867 (1969-11-01), Walsh
patent: 3636492 (1972-01-01), Yamashita et al.
patent: 3853091 (1974-10-01), Christensen et al.
patent: 4267212 (1981-05-01), Sakawaki
patent: 4347302 (1982-08-01), Golman

Affiliated with

Also associated with

Rating

Semiconductor spin coating method does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Semiconductor spin coating method, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Semiconductor spin coating method will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1091203