Semiconductor production device ceramic plate

Electric heating – Heating devices – Combined with container – enclosure – or support for material...

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C219S543000, C219S544000, C118S724000

Reexamination Certificate

active

07084376

ABSTRACT:
A ceramic board is provided which, when used as a heater, heats a silicon wafer uniformly throughout and, hence, does not damage the wafer and, when used as an electrostatic chuck, provides a sufficient chucking force. A ceramic board is provided for semiconductor manufacture apparatuses comprising a ceramic substrate and a semiconductor wafer mounted thereon directly or supported indirectly at a fixed distance from its surface, wherein the surface of said ceramic substrate, where said semiconductor wafer is to be mounted or supported, is controlled to a flatness of 1 to 50 μm over a measurement range of [(diametric end-to-end length)−10 mm].

REFERENCES:
patent: 4804823 (1989-02-01), Okuda et al.
patent: 5151871 (1992-09-01), Matsumura et al.
patent: 5280156 (1994-01-01), Niori et al.
patent: 5463526 (1995-10-01), Mundt
patent: 5904872 (1999-05-01), Arami et al.
patent: 6080970 (2000-06-01), Yoshida et al.
patent: 6133557 (2000-10-01), Kawanabe et al.
patent: 6150636 (2000-11-01), Bogdanski et al.
patent: 6344632 (2002-02-01), Yu et al.
patent: 6465763 (2002-10-01), Ito et al.
patent: 6507006 (2003-01-01), Hiramatsu et al.
patent: 2-35438 (1990-03-01), None
patent: 2-174116 (1990-07-01), None
patent: 4-078138 (1992-03-01), None
patent: 4-287344 (1992-10-01), None
patent: 6-291049 (1994-10-01), None
patent: 7-183342 (1995-07-01), None
patent: 7-297265 (1995-11-01), None
patent: 8-66071 (1996-03-01), None
patent: 10-275524 (1998-10-01), None
patent: 10-289944 (1998-10-01), None
patent: 10-338574 (1998-12-01), None
patent: 11-40330 (1999-02-01), None
patent: 11-074064 (1999-03-01), None
patent: 11-111829 (1999-04-01), None
Applied Machine Engineering (Ouyoh Kikai Kogaku), vol. 30, No. 5, pp. 128-133, “Characteristic and Application of Ceramic Electrostatic Chuck”, May, 1989 (with English translation).
U.S. Appl. No. 10/732,296, filed Dec. 11, 2003, Ito, et al.
U.S. Appl. No. 10/746,081, filed Dec. 29, 2003, Hiramatsu, et al.
U.S. Appl. No. 10/755,308, filed Jan. 13, 2004, Hiramatsu, et al.
U.S. Appl. No. 10/766,027, filed Jan. 29, 2004, Ito, et al.
U.S. Appl. No. 10/759,083, filed Jan. 20, 2004, Hiramatsu, et al.
U.S. Appl. No. 10/928,146, filed Aug. 30, 2004, Hiramatsu, et al.
U.S. Appl. No. 10/876,665, filed Jun. 28, 2004, Ito, et al.
U.S. Appl. No. 10/901,109, filed Jul. 29, 2004, Hiramatsu, et al.
U.S. Appl. No. 10/900,113, filed Jul. 28, 2004, Hiramatsu, et al.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Semiconductor production device ceramic plate does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Semiconductor production device ceramic plate, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Semiconductor production device ceramic plate will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-3700048

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.