Semiconductor processor with wafer face protection

Details Semiconductor processor with wafer face protection Semiconductor processor with wafer face protection

1995-08-17

1998-06-09

Powell, William

Adhesive bonding and miscellaneous chemical manufacture

Differential fluid etching apparatus

With microwave gas energizing means

216 58, 438706, H01L 2100

Patent

active

057627517

ABSTRACT:
A semiconductor processing station which utilizes a processing head and processing base which are complementary to enclose a processing chamber. The processing head shown has a rotor with two portions both of which rotate. The rotor has axial movable portions which include a piece holder. The piece holder supports a wafer or other semiconductor piece being processed. The piece holder can be axially extended and retracted relative to a thin membrane which acts as a cover to prevent chemicals from reaching the back side of the wafer during processing.

REFERENCES:
patent: 5500081 (1996-03-01), Bergman

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