Drying and gas or vapor contact with solids – Apparatus – With apparatus using centrifugal force
Patent
1991-05-17
1992-12-29
Bennet, Henry A.
Drying and gas or vapor contact with solids
Apparatus
With apparatus using centrifugal force
34 8, 34184, 2103601, F26B 1724
Patent
active
051740451
ABSTRACT:
A processor for centrifugal processing of semiconductor wafers and similar units without a wafer carrier. The processor is specially constructed to provide an automatically extendible and retractable rotor head to allow automated loading and unloading of discrete wafers onto the rotor head. The rotor head includes means for holding the wafers in spaced discrete relationship without a carrier. The processor includes a novel shaft assembly construction which includes an axially extendible shaft controlled using pressurized fluid. The pressurized fluid is supplied to the shaft assembly by a pressure supply which is controllably extendible and retractable for engagement with the shaft assembly when rotation is stopped. The shaft assembly also preferably incorporates an axial locking mechanism which holds the axially movable components of the shaft assembly in fixed axial position during rotation, while allowing release when rotation is stopped so that movable portions of the shaft assembly can be axially extended.
REFERENCES:
patent: 4300581 (1981-11-01), Thompson
patent: 4571850 (1986-02-01), Hunt et al.
patent: 4693017 (1987-09-01), Oehler et al.
patent: 4907349 (1990-03-01), Algo
Owczarz Aleksander
Thompson Raymon F.
Bennet Henry A.
Gromada Denise L. F.
Semitool Inc.
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