Semiconductor processor apparatus with dynamic wafer vapor treat

Details Semiconductor processor apparatus with dynamic wafer vapor treat Semiconductor processor apparatus with dynamic wafer vapor treat

1991-03-06

1993-08-17

Stinson, Frankie L.

Cleaning and liquid contact with solids

Apparatus

With heating, cooling or heat exchange means

134157, 134182, 134902, 134200, B08B 310

Patent

active

052359956

ABSTRACT:
Disclosed are apparatuses and methods for improved processing of semiconductor wafers and the using vapor phase processing chemicals, particularly aqueous hydrofluoric acid etchants. Homogeneous vapor mixtures are generated from homogeneous liquid mixtures. Means for recirculating, mixing and agitating the liquid phase reactants are provided. In some embodiments the liquid phase is advantageously circulated through a chemical trench within the processing bowl. Exposure of wafers to vapors from the chemical trench can be controlled by a vapor control valve which is advantageously the bottom of the processing chamber. The wafer is rotated or otherwise moved within the processing chamber to provide uniform dispersion of the homogeneous reactant vapors across the wafer surface and to facilitate vapor circulation to the processed surface. A radiative volatilization processor can be utilized to volatilize reaction by-products which form under some conditions. The apparatuses provide efficient uniform etching with low particle count performance.

REFERENCES:
patent: 3489608 (1970-01-01), Jacobs et al.
patent: 3727620 (1973-04-01), Orr
patent: 4693777 (1987-09-01), Hazano et al.
patent: 4736758 (1988-04-01), Kusuhara
patent: 4745422 (1988-05-01), Matsuoka et al.
patent: 4885047 (1989-12-01), Ury et al.
patent: 4977688 (1990-12-01), Roberson, Jr. et al.

Affiliated with

Also associated with

Rating

Semiconductor processor apparatus with dynamic wafer vapor treat does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Semiconductor processor apparatus with dynamic wafer vapor treat, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Semiconductor processor apparatus with dynamic wafer vapor treat will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-2237653