Semiconductor processing workpiece position sensing

Details Semiconductor processing workpiece position sensing Semiconductor processing workpiece position sensing

1997-09-30

2000-01-18

Krynski, William

Coating apparatus

Control means responsive to a randomly occurring sensed...

Responsive to attribute, absence or presence of work

118669, 156345LS, 156345MT, 438 14, B05C 1100

Patent

active

060154624

ABSTRACT:
The present invention provides semiconductor workpiece position sensors and methods of monitoring the position of a semiconductor workpiece. One embodiment of the invention provides a method of monitoring position of a semiconductor workpiece including providing a process module including a process container having a process fluid therein and a workpiece holder configured to support the semiconductor workpiece, moving the semiconductor workpiece toward the process fluid within the process container, applying a reference signal to the process module, and indicating position of the semiconductor workpiece with respect to the process fluid responsive to the reference signal.

REFERENCES:
patent: 3032753 (1962-05-01), Knapp et al.
patent: 3607549 (1971-09-01), Bielefeld, Jr. et al.
patent: 4662975 (1987-05-01), Dufresne et al.
patent: 4995939 (1991-02-01), Ferenczi et al.
patent: 5168886 (1992-12-01), Thompson et al.
patent: 5578167 (1996-11-01), Sooriakumar et al.

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