Semiconductor processing with non-jetting fluid stream discharge

Details Semiconductor processing with non-jetting fluid stream discharge Semiconductor processing with non-jetting fluid stream discharge

1993-08-23

1996-02-06

Lacey, David L.

Cleaning and liquid contact with solids

Processes

Using sequentially applied treating agents

134 2, 134 3, 134 27, 134 32, 134 33, 134 34, 134 36, 437946, 216 90, B08B 304

Patent

active

054893410

ABSTRACT:
A semiconductor processor and methods using pillar shaped liquid emitters. The emitters have emission ports upon which liquid domes of processing chemicals are formed. The domes are applied to the surface of a wafer to wash discrete areas and thereby allow gases evolved from the reaction to easily escape about the domes and through gas passageways existing about the pillars. The wafer is rotated to provide even processing of the treated surface.

REFERENCES:
patent: 4165252 (1979-08-01), Gibbs
patent: 4495024 (1985-01-01), Bok
patent: 4519846 (1985-05-01), Aigo
patent: 4600463 (1986-07-01), Aigo
patent: 4681776 (1987-07-01), Bok
patent: 4936940 (1990-06-01), Kawasumi et al.
patent: 5168886 (1992-12-01), Thompson

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