Semiconductor processing using vapor mixtures

Details Semiconductor processing using vapor mixtures Semiconductor processing using vapor mixtures

1999-07-01

2000-12-19

Powell, William

Semiconductor device manufacturing: process

Chemical etching

Vapor phase etching

156345, H01L 2100

Patent

active

061627348

ABSTRACT:
Processing methods and systems using vapor phase processing streams made from a liquid phase source and feed gas. Some versions use multiple liquid sources and multiple vapor generators which each produce vapors which are mixed. Some of the vapor generators use metering pumps to inject a controlled flow of liquid into a controlled flow of feed gas. In some embodiments the vapors are exsiccated to reduce saturation before being introduced as a processing chamber vapor mixture into a processing chamber. The semiconductor pieces are preferably rotated within the processing chamber and can be processed in batches.

REFERENCES:
patent: 5112437 (1992-05-01), Watanabe et al.

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