Semiconductor processing techniques utilizing vacuum...

Radiant energy – Invisible radiant energy responsive electric signalling – Ultraviolet light responsive means

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

Reexamination Certificate

active

07026626

ABSTRACT:
A spectroscopy system is provided which operates in the vacuum ultraviolet spectrum. More particularly, a system utilizing reflectometry techniques in the vacuum ultraviolet spectrum is provided for use in metrology applications. To ensure accurate and repeatable measurement, the environment of the optical path is controlled to limit absorption effects of gases that may be present in the optical path. The VUV reflectometer may be utilized to monitor a wide range of data in a semiconductor processing environment. For example, the techniques may be used for measuring thicknesses, optical properties, composition, porosity and roughness of a film or stack of films. Further, the VUV techniques and apparatus may be used to characterize critical dimensions and other features of a device. The VUV reflectometer system may be utilized as a stand alone tool, or the relatively compact nature of the system may be taken advantage of such that the system is incorporated into other process tools. Thus, for example, the VUV techniques described herein may be incorporated directly into tools used for deposition, etch, photolithography, etc. so that in-line measurements, monitoring and control may be advantageously obtained.

REFERENCES:
patent: 3091154 (1963-05-01), Hall
patent: 3572951 (1971-03-01), Rothwarf et al.
patent: 3825347 (1974-07-01), Kaiser
patent: 4368983 (1983-01-01), Bennett
patent: 4899055 (1990-02-01), Adams
patent: 4984894 (1991-01-01), Kondo
patent: 5042949 (1991-08-01), Greenberg et al.
patent: 5182618 (1993-01-01), Heinonen
patent: RE34783 (1994-11-01), Coates
patent: 5607800 (1997-03-01), Ziger
patent: 5608526 (1997-03-01), Piwonka-Corle et al.
patent: 5747813 (1998-05-01), Norton et al.
patent: 5781304 (1998-07-01), Kotidis et al.
patent: 5798837 (1998-08-01), Aspnes et al.
patent: 5880831 (1999-03-01), Buermann et al.
patent: 5900939 (1999-05-01), Aspnes et al.
patent: 5917594 (1999-06-01), Norton
patent: 5991022 (1999-11-01), Buermann et al.
patent: 6128085 (2000-10-01), Buermann et al.
patent: 6181427 (2001-01-01), Yarussi et al.
patent: 6261853 (2001-07-01), Howell et al.
patent: 6278519 (2001-08-01), Rosencwaig et al.
patent: 6297880 (2001-10-01), Rosencwaig et al.
patent: 6304326 (2001-10-01), Aspnes et al.
patent: 6313466 (2001-11-01), Olsen et al.
patent: 6411385 (2002-06-01), Aspnes et al.
patent: 6414302 (2002-07-01), Freeouf
patent: 6417921 (2002-07-01), Rosencwaig et al.
patent: 6710865 (2004-03-01), Forouhi et al.
patent: 2001/0055118 (2001-12-01), Nawracala
patent: 2002/0030826 (2002-03-01), Chalmers et al.
patent: 2002/0149774 (2002-10-01), McAninch
patent: 2002/0154302 (2002-10-01), Rosencwaig et al.
patent: 2003/0071996 (2003-04-01), Wang et al.
patent: 2004/0150820 (2004-08-01), Nikoonahad et al.
Search Report;PCT/US04/30859; 13 pgs., not a publication.
McPherson Product Brochure “Reflectometer for Sample Analysis,” McPherson, Inc., Massachusetts, Published Prior to Sep. 23, 2003, 1-2 pps.
McPherson Product Brochure “Spectral Reflectometer,” McPherson, Inc., Massachusetts, Nov. 12, 2001, 1 pg.
McPherson Product Brochure “VUVaS Spectrophotometers for 115 nm to >380 nm,” McPherson, Inc., Massachusetts, Published Prior to Sep. 23, 2003, 1-4 pps.
McPherson Product Brochure “VUVaS Spectrophotometers, Made to Measure 115-380 nm,” McPherson, Inc., Massachusetts, Published Prior to Sep. 23, 2003, 1-8 pps.
Acton Research Product Brochure “Acton Research Purged CAMS Optical Measurement System,” Acton Research Corporation, Massachusetts, Published Prior to Sep. 23, 2003, 1-2 pps.
“The Thin Film tool for next generation lithography at 157nm,” Web page from http://www.sopra-sa.com, Sopra, Printed From Internet On Feb. 19, 2002, 1pg.
“SE and GXR combined on the same instrument,” Web page from http://www.sopra-sa.com, Sopra, Printed From Internet on Feb. 19, 2002, 1 pg.
“The ideal Thin Film characterization unit for Development and Pilot Line environment,” Web page from http://www.sopra-sa.com, Sopra, Printed From Internet on Feb. 19, 2002, 1 pg.
“VUV-VASE™, The Award Winning VUV-VASE™ is the latest addition to our line of Spectroscopic Ellipsometers,” Web pages from http://www.jawoolam.com, J.A. Woollam Company, Nebraska, Printed From Internet on Nov. 5, 2002, 1-2 pps.
“Vacuum UV Spectroscopic Ellipsometers,” Web pages from http://www.sentech.de, Sentech Instruments, Printed From Internet on Feb. 20, 2002, 1-3 pps.
Rubloff, “Surface Reflectance Spectroscopy System”, Technical Disclosure, 1p.com, www.ip.com, May 1, 1977, 5 pgs., TDB 05-77 p4811-4813.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Semiconductor processing techniques utilizing vacuum... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Semiconductor processing techniques utilizing vacuum..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Semiconductor processing techniques utilizing vacuum... will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-3623897

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.