Semiconductor processing of silicon nitride

Details Semiconductor processing of silicon nitride Semiconductor processing of silicon nitride

1976-03-18

1978-02-21

Kendall, Ralph S.

Coating processes

Electrical product produced

Integrated circuit, printed circuit, or circuit board

96 351, 134 2, 427307, 427318, 427327, 427344, 427352, 156659, H01L 21304, H01L 21306

Patent

active

040753670

ABSTRACT:
A method of providing improved adherence of photoresist to a silicon nitride layer on a semiconductor wafer by first preparing a heated solution of trichlorophenylsilane, immersing the nitride coated wafer in the trichlorophenylsilane solution, drying and baking the wafer prior to the application of the photoresist.

REFERENCES:
patent: 3482977 (1969-12-01), Baker
patent: 3549368 (1970-12-01), Collins
patent: 3586554 (1971-06-01), Couture et al.
patent: 3706612 (1972-12-01), Palmer
patent: 3758306 (1973-09-01), Roos
patent: 3867218 (1975-02-01), Henry
patent: 3898351 (1975-08-01), Kennison
patent: 3911169 (1975-10-01), Lesaicherre
patent: 3962004 (1976-06-01), Sonneborn

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