Semiconductor processing gas diffuser plate

Details Semiconductor processing gas diffuser plate Semiconductor processing gas diffuser plate

1992-03-17

1993-05-25

Yuen, Henry C.

Heating

Having mask, baffle or conductor concentrating heat on or...

432249, 432253, 432 17, F24J 300

Patent

active

052134970

ABSTRACT:
Disclosed is a baffle apparatus for insertion into a semiconductor wafer processing furnace to diffuse processing gases that are injected into the furnace by an injector nozzle. The baffle apparatus comprises:

REFERENCES:
patent: 4355974 (1982-10-01), Lee
patent: 4911638 (1990-03-01), Bayne et al.
patent: 4925388 (1990-05-01), Iseki et al.
patent: 4976612 (1990-12-01), Adams
patent: 4979897 (1990-12-01), Yates
patent: 5024599 (1991-06-01), Chhabra

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