Heating – Work chamber having heating means – Work chamber having gaseous material supply or removal...
Patent
1990-04-24
1991-06-11
Bennett, Henry A.
Heating
Work chamber having heating means
Work chamber having gaseous material supply or removal...
432152, F27B 516, F27B 904
Patent
active
050228536
ABSTRACT:
Disclosed is a quartz tube for a furnace for processing semiconductor wafers. The furnace comprises:
REFERENCES:
patent: 4680008 (1987-07-01), Rioux
patent: 4767251 (1988-08-01), Whang
Chhabra Navjot
Powell Eric
Bennett Henry A.
Kilner Christopher B.
Micro)n Technology, Inc.
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