Semiconductor processing apparatus with lift pin structure

Details Semiconductor processing apparatus with lift pin structure Semiconductor processing apparatus with lift pin structure

2006-01-12

2009-12-29

Hassanzadeh, Parviz (Department: 1792)

Coating apparatus

Gas or vapor deposition

Work support

C156S345510

Reexamination Certificate

active

07638003

ABSTRACT:
A semiconductor processing apparatus includes: a reaction chamber; a susceptor disposed in the reaction chamber for placing a substrate thereon and having through-holes in an axial direction of the susceptor; lift pins slidably disposed in the respective through-holes for lifting the substrate over the susceptor; and a means for reducing contact resistance between the lift pins and the respective through-holes.

REFERENCES:
patent: 4790258 (1988-12-01), Drage et al.
patent: 5421893 (1995-06-01), Perlov
patent: 5562947 (1996-10-01), White et al.
patent: 6190113 (2001-02-01), Bui et al.
patent: 6435798 (2002-08-01), Satoh
patent: 6955741 (2005-10-01), Yamagishi
patent: 7422655 (2008-09-01), Asakura
patent: 2004/0045509 (2004-03-01), Or et al.
patent: 2005-150725 (2005-06-01), None
patent: WO 2004095568 (2004-11-01), None

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