Coating apparatus – Gas or vapor deposition – Work support
Reexamination Certificate
2003-03-03
2010-11-23
Hassanzadeh, Parviz (Department: 1716)
Coating apparatus
Gas or vapor deposition
Work support
C118S715000, C118S729000, C118S730000, C156S345510, C156S345520, C156S345530, C156S345540, C156S345550
Reexamination Certificate
active
07837798
ABSTRACT:
An apparatus for manufacturing a semiconductor or liquid crystal is provided with a reaction chamber housing a ceramic holder with an embedded resistive heating element, and a cylindrical support member one end of which supports the ceramic holder and the other end of which side is fixed to the reaction chamber. One end of the cylindrical support member is hermetically bonded to the ceramic holder; and a partition plate and sealing material hermetically seal the other end of which side. Embodiments include partitioning the space within the cylindrical support member with the ceramic holder, and the partition plate and depressurizing to vacuum or to a reduced pressure atmosphere of an inert gas. Advantageously the cylindrical support member can easily be hermetically sealed, corrosion and oxidation of electrode terminals exposed on the rear surface of the ceramic holder prevented, the thermal uniformity and thermal efficiency of the holder improved, and the length of the cylindrical support member reduced, thereby reducing the size of the reaction chamber.
REFERENCES:
patent: 5269822 (1993-12-01), Carolan et al.
patent: 5462603 (1995-10-01), Murakami
patent: 5478429 (1995-12-01), Komino et al.
patent: 5688331 (1997-11-01), Aruga et al.
patent: 6031235 (2000-02-01), Ishida et al.
patent: 6126753 (2000-10-01), Shinriki et al.
patent: 6756235 (2004-06-01), Liu et al.
patent: 0 581 249 (1993-07-01), None
patent: 0 628 644 (1994-05-01), None
patent: 2 279 366 (1995-01-01), None
patent: 64-62381 (1989-03-01), None
patent: 05-267191 (1993-10-01), None
patent: 6-50435 (1994-02-01), None
patent: 7-78766 (1995-03-01), None
patent: 7-153706 (1995-06-01), None
patent: 08-218172 (1996-08-01), None
Merriam-Webster Online Dictionary, www.m-w.com/dictionary/embed.
Japanese Office Action for Corresponding Patent Application No. JP 2002-058149, dispatched Mar. 14, 2006.
Kuibira Akira
Nakata Hirohiko
Natsuhara Masuhiro
Dhingra Rakesh
Hassanzadeh Parviz
McDermott Will & Emery LLP
Sumitomo Electric Industries Ltd.
LandOfFree
Semiconductor processing apparatus with a heat resistant... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Semiconductor processing apparatus with a heat resistant..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Semiconductor processing apparatus with a heat resistant... will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-4243363