Coating apparatus – Gas or vapor deposition – Multizone chamber
Reexamination Certificate
2007-10-02
2007-10-02
Moore, Karla (Department: 1763)
Coating apparatus
Gas or vapor deposition
Multizone chamber
C118S728000, C118S730000, C118S733000, C156S345310, C156S345510, C156S345540
Reexamination Certificate
active
10897061
ABSTRACT:
A semiconductor-processing apparatus comprises a susceptor and removable placing blocks detachably placed at a periphery of the susceptor for transferring a substrate. Retractable supporting members are provided for detaching/attaching the placing blocks from/to the susceptor.
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U.S. Appl. No. filed May 7, 2004, Baiei Kawano.
Arai Hiroki
Fukuda Hideaki
Kawano Baiei
Shimizu Akira
Yamagishi Takayuki
ASM Japan K.K.
Knobbe Martens Olson & Bear LLP
Moore Karla
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