Semiconductor processing apparatus for creating back pressure wi

Details Semiconductor processing apparatus for creating back pressure wi Semiconductor processing apparatus for creating back pressure wi

1990-04-24

1991-06-18

Yuen, Henry C.

Heating

Having mask, baffle or conductor concentrating heat on or...

432249, 432253, 432 17, F24J 300

Patent

active

050245996

ABSTRACT:
Disclosed is a semiconductor processing furnace flow restricting apparatus for insertion into a longitudinally elongated semiconductor wafer processing furnace to create back pressure to increase residence time of processing gases within the furnace. The apparatus comprises:

REFERENCES:
patent: 4355974 (1982-10-01), Lee
patent: 4911638 (1990-03-01), Bayne et al.
patent: 4925388 (1990-05-01), Iseki et al.

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