Semiconductor processing apparatus and a diagnosis method...

Details Semiconductor processing apparatus and a diagnosis method... Semiconductor processing apparatus and a diagnosis method...

2005-03-15

2005-03-15

Hassanzadeh, Parviz (Department: 1763)

Adhesive bonding and miscellaneous chemical manufacture

Differential fluid etching apparatus

With measuring, sensing, detection or process control means

C118S712000, C134S001000

Reexamination Certificate

active

06866744

ABSTRACT:
A semiconductor processing apparatus for applying plasma treatment to a sample arranged in a vacuum process chamber includes a plasma generator for generating plasma inside the vacuum process chamber and a process gas supply for introducing a process gas into the vacuum process chamber. The apparatus further includes an oscillator for imparting mechanical oscillation to the semiconductor processing apparatus, a receiver for detecting mechanical oscillation generated by the oscillator in the semiconductor processing apparatus as a signal, and an analyzer for analyzing the detected signal to diagnose whether the vacuum process chamber is normally assembled.

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patent: 6214706 (2001-04-01), Madan et al.
patent: 6427622 (2002-08-01), Madan et al.
patent: 58200539 (1983-11-01), None
patent: 06275578 (1994-09-01), None

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