Cleaning compositions for solid surfaces – auxiliary compositions – Cleaning compositions or processes of preparing – For cleaning a specific substrate or removing a specific...
Reexamination Certificate
2011-08-23
2011-08-23
Webb, Gregory E (Department: 1761)
Cleaning compositions for solid surfaces, auxiliary compositions
Cleaning compositions or processes of preparing
For cleaning a specific substrate or removing a specific...
C510S176000, C134S001300
Reexamination Certificate
active
08003587
ABSTRACT:
A composition that includes 2-(2-aminoethylamino)-ethanol, at least one of a chelating agent and a corrosion inhibitor, and water. The composition is capable of removing organic, organometallic and metal oxide residues from semiconductor substrates. The invention also relates to a method of removing etching residue from a semiconductor substrate.
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International Search Report (PCT/US2002/20840); Jun. 23, 2003.
Kuroda Akira
Lee Wai Mun
Matsumoto Takanori
Otake Atsushi
Shang Cass X
Dunlap Codding P.C.
EKC Technology, Inc.
Webb Gregory E
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