Semiconductor printing apparatus with multiple independent tempe

Radiant energy – Photocells; circuits and apparatus – Photocell controls its own optical systems

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324158F, 355 30, G01N 2186

Patent

active

045033358

ABSTRACT:
A semiconductor printing apparatus eliminates the alignment error caused by any relative deformation between the mask and the wafer due to variations in parameters such as temperature change, and intermediate processing, for example, etching etc. The apparatus is characterized by the provision of a device for cooling or heating respectively and independently plural different sections of at least either of the mask and the wafer.

REFERENCES:
patent: 3937579 (1976-02-01), Schmidt
patent: 3963985 (1976-06-01), Geldermans
patent: 4202623 (1980-05-01), Watkin

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