Measuring and testing – Fluid pressure gauge – Diaphragm
Reexamination Certificate
2005-05-17
2005-05-17
Hirshfeld, Andrew H. (Department: 2854)
Measuring and testing
Fluid pressure gauge
Diaphragm
C073S717000, C073S723000, C073S777000, C361S283100, C361S283400
Reexamination Certificate
active
06892582
ABSTRACT:
The object of the present invention is to propose an etch channel sealing structure characterized by excellent impermeability to moisture and resistance to temporal change of the diaphragm in the pressure sensor produced according to the sacrificial layer etching technique, and to provide a pressure sensor characterized by excellent productivity and durability. After a very small gap is formed by the sacrificial layer etching technique, silicon oxide film is deposited by the CVD technique or the like, thereby sealing the etch channel. Further, impermeable thin film of polysilicon or the like is formed to cover the oxide film.This allows an etch channel sealing structure to be simplified in the pressure sensor produced according to the sacrificial layer etching technique, and prevents entry of moisture into the cavity, thereby improving moisture resistance. Moreover, sealing material with small film stress reduces temporal deformation of the diaphragm.
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Search Report.
Horie Junichi
Kuryu Seiji
Miyazaki Atsushi
Momma Naohiro
Onose Yasuo
Crowell & Moring LLP
Ferguson Marissa
Hirshfeld Andrew H.
Hitachi Car Engineering Co. Ltd.
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