Semiconductor plating system workpiece support having...

Electrolysis: processes – compositions used therein – and methods – Electrolytic coating – Coating selected area

Reexamination Certificate

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C204S22400M, C204S285000, C204S290010, C204S297010, C205S143000, C205S157000, C205S291000

Reexamination Certificate

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06936153

ABSTRACT:
A semiconductor workpiece holder used in electroplating systems for plating metal layers onto a semiconductor workpieces, and is of particular advantage in connection with plating copper onto semiconductor materials. The workpiece holder includes electrodes which have a contact face which bears against the workpiece and conducts current therebetween. The contact face is provided with a contact face outer contacting surface which is made from a contact face material similar similar to the workpiece plating material which is to be plated onto the semiconductor workpiece. The contact face can be formed by pre-conditioned an electrode contact using a plating metal which is similar to the plating materials which is to be plated onto the semiconductor workpiece.

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F.A. Lowenheim,Electroplating, McGraw-Hill Book Company, New York, pp 169,170,269, 1978, month of publication not available.

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