Semiconductor package, method of manufacturing the same, and...

Semiconductor device manufacturing: process – Packaging or treatment of packaged semiconductor – Assembly of plural semiconductive substrates each possessing...

Reexamination Certificate

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C438S106000, C438S125000, C174S250000, C174S256000, C174S260000, C428S901000

Reexamination Certificate

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06884655

ABSTRACT:
A wiring layer for serving as a first electrode layer of a capacitor portion patterned in a predetermined shape on an insulative base member is formed. A resin layer for serving as a dielectric layer of the capacitor portion is formed on a surface of the wiring layer using an electrophoretic process. Another wiring layer for serving as a second electrode layer of the capacitor portion patterned in a predetermined shape by patterning on the insulative base member inclusive of the resin layer is formed.

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Nakamura et al.; “Polyimide Films Prepared by Electrophoretic Deposition and Their Dielectric Breakdown”, SPIE, vol. 2780, pp. 71-75, Sep. 11-14, 1995.

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