Semiconductor optical devices with differential grating...

Details Semiconductor optical devices with differential grating... Semiconductor optical devices with differential grating...

2005-04-26

2005-04-26

Kim, Ellen E. (Department: 2874)

Optical waveguides

Planar optical waveguide

Thin film optical waveguide

C385S037000, C372S043010, C372S092000, C372S102000

Reexamination Certificate

active

06885804

ABSTRACT:
A semiconductor optical device with a differential grating formed by a holography method and a method for manufacturing the same are provided. The provided semiconductor optical device includes an n-type InP substrate, a stack structure on the InP substrate having a waveguide and active layers, a first grating formed under the stack structure and on the InP substrate, and a second grating formed on the stack structure. The provided method for manufacturing the semiconductor optical device forms a first grating on the n-type InP substrate and under the active layer, and forms a second grating on the active layer. The first and second gratings are formed by the holography method.

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Electronics Letters, Feb. 17th, 2000, vol. 396, No. 4, “Self-pulsating DFB laser for all-optical clock recover at 40Gbit/s”, 2 pages.

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