Semiconductor optical device and manufacturing method thereof

Details Semiconductor optical device and manufacturing method thereof Semiconductor optical device and manufacturing method thereof

2007-10-09

2007-10-09

Lee, Hsien-Ming (Department: 2823)

Semiconductor device manufacturing: process

Making device or circuit emissive of nonelectrical signal

Including integrally formed optical element

C438S039000, C438S694000, C438S725000

Reexamination Certificate

active

11031003

ABSTRACT:
In a dry etching step for an organic material film, a fluorine-containing member is disposed to the periphery of a semiconductor substrate disposed on a lower electrode or a tray for wafer transportation to form fluorine (fluoro-radicals) from the member per se in addition to the fluoric gas added to the etching gas, with a purpose of removing reaction products, thereby removing reaction products deposited on the semiconductor substrate efficiently and stably.

REFERENCES:
patent: 4482419 (1984-11-01), Tsukada et al.
patent: 6773945 (2004-08-01), Yamada
patent: 6828243 (2004-12-01), Denpoh
patent: 3-177020 (1991-08-01), None

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