Semiconductor on insulator and methods of forming same using...

Details Semiconductor on insulator and methods of forming same using... Semiconductor on insulator and methods of forming same using...

2009-08-26

2011-11-22

Garber, Charles (Department: 2812)

Semiconductor device manufacturing: process

Bonding of plural semiconductor substrates

C438S458000, C257SE21088, C257SE21122, C257SE21568, C257SE27137, C257SE27144, C257SE21161

Reexamination Certificate

active

08062956

ABSTRACT:
Methods and apparatus for producing a semiconductor on glass (SOG) structure include: bringing a first surface of a glass substrate into direct or indirect contact with a semiconductor wafer; heating at least one of the glass substrate and the semiconductor wafer such that a second surface of the glass substrate, opposite to the first surface thereof, is at a lower temperature than the first surface; applying a voltage potential across the glass substrate and the semiconductor wafer; and maintaining the contact, heating and voltage to induce an anodic bond between the semiconductor wafer and the glass substrate via electrolysis.

REFERENCES:
patent: 5673476 (1997-10-01), Akaike et al.
patent: 7176528 (2007-02-01), Couillard et al.
patent: 7192844 (2007-03-01), Couillard et al.
patent: 7399681 (2008-07-01), Couillard et al.
patent: 7476940 (2009-01-01), Couillard et al.
patent: 2005/0255670 (2005-11-01), Couillard et al.
patent: 2007/0246450 (2007-10-01), Cady et al.
patent: 2007/0281399 (2007-12-01), Cites et al.
patent: 2001-010847 (2001-01-01), None
patent: WO 2006/023289 (2006-03-01), None
Incropera et al. (“Introduction to Heat Transfer”, John Wiley and Sons, 4th edition, section 1.3.2, pp. 21-24, 2002).

Affiliated with

Also associated with

Rating

Semiconductor on insulator and methods of forming same using... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Semiconductor on insulator and methods of forming same using..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Semiconductor on insulator and methods of forming same using... will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-4275722