Semiconductor memory with leak-resistant bit lines

Static information storage and retrieval – Interconnection arrangements

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365 51, 257767, G11C 506

Patent

active

052914330

ABSTRACT:
Each of the bit lines of a semiconductor memory has an intermediate section with low electrical resistance and low electromigration resistance. If the bit line is shorted to a word line, during burn-in the electrical resistance of the intermediate section increases because of electromigration, thereby preventing excess current from leaking through the shorted bit line during subsequent use.

REFERENCES:
patent: 4931845 (1990-06-01), Ema
patent: 4937652 (1990-06-01), Okumura
patent: 5051812 (1991-09-01), Onuki
Kikuda et al., "Optimized Redundancy Selection Based on Failure-Related Yield Model for 64Mb DRAM and Beyond," Digest of Technical Papers, sec. TAM 6.1, pp. 104-105 (1991 IEEE International Solid-State Circuits Conference).

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