Semiconductor memory device with memory cells arranged in...

Static information storage and retrieval – Interconnection arrangements – Transistors or diodes

Reexamination Certificate

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C365S134000, C365S203000, C365S207000, C365S214000

Reexamination Certificate

active

06867994

ABSTRACT:
A field region forming a transistor is provided in a direction crossing a word line and a bit line. A bit line contact is provided corresponding to each bit line in a row direction. Storage node contacts are provided in alignment corresponding to respective columns in the row direction. The size of a basic cell region for forming a single memory cell can be set to 2·F·3·F. Here, F represents a minimum design size. Accordingly, memory cells in a twin cell mode DRAM storing one bit of data with two memory cells can be reduced in size.

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patent: 6316306 (2001-11-01), Park
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patent: 20020089870 (2002-07-01), Honda
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patent: 20040071022 (2004-04-01), Wald et al.
patent: 20040201054 (2004-10-01), Siek
patent: 7-130172 (1995-05-01), None
patent: 8-293587 (1996-11-01), None
Iizuka, Tetsuya “Design of CMOS VLSI” (Apr. 15, 1989) p. 90, (w/partial English translation).

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