Static information storage and retrieval – Floating gate
Reexamination Certificate
2006-12-01
2010-10-26
Hoang, Huan (Department: 2827)
Static information storage and retrieval
Floating gate
C365S185180, C365S185150, C257S324000, C438S287000
Reexamination Certificate
active
07821823
ABSTRACT:
Disclosed is a semiconductor storage device comprising a semiconductor substrate, a first and a second impurity diffusion layer formed in the semiconductor substrate, a gate insulating film formed on the semiconductor substrate, and a first gate electrode formed on the semiconductor substrate via the gate insulating film. The gate insulating film has a nitrogen-containing silicon oxide film inside, and a silicon oxide film is so arranged on both sides of the nitrogen-containing silicon oxide film as to sandwich the nitrogen-containing silicon oxide film. In addition, the nitrogen composition in the nitrogen-containing silicon oxide film is increased from the semiconductor substrate side to the first gate electrode side.
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Masuzaki Kouji
Sunamura Hiroshi
Terai Masayuki
Hoang Huan
NEC Electronics Corporation
Young & Thompson
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