Semiconductor memory device, method of driving the same and...

Static information storage and retrieval – Floating gate

Reexamination Certificate

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C365S185180, C365S185150, C257S324000, C438S287000

Reexamination Certificate

active

07821823

ABSTRACT:
Disclosed is a semiconductor storage device comprising a semiconductor substrate, a first and a second impurity diffusion layer formed in the semiconductor substrate, a gate insulating film formed on the semiconductor substrate, and a first gate electrode formed on the semiconductor substrate via the gate insulating film. The gate insulating film has a nitrogen-containing silicon oxide film inside, and a silicon oxide film is so arranged on both sides of the nitrogen-containing silicon oxide film as to sandwich the nitrogen-containing silicon oxide film. In addition, the nitrogen composition in the nitrogen-containing silicon oxide film is increased from the semiconductor substrate side to the first gate electrode side.

REFERENCES:
patent: 6191975 (2001-02-01), Shimizu et al.
patent: 6674109 (2004-01-01), Fujimori et al.
patent: 7411242 (2008-08-01), Kobayashi et al.
patent: 54-163679 (1979-12-01), None
patent: 2001-156189 (2001-06-01), None
patent: 2002-9179 (2002-01-01), None
patent: 2002-203917 (2002-07-01), None
patent: 2002-217317 (2002-08-01), None
patent: 2002-261175 (2002-09-01), None
patent: 2003-282567 (2003-10-01), None
patent: 2004-235519 (2004-08-01), None
patent: 2005-228760 (2005-08-01), None

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