Active solid-state devices (e.g. – transistors – solid-state diode – Non-single crystal – or recrystallized – semiconductor... – Field effect device in non-single crystal – or...
Patent
1992-03-06
1994-03-29
Hille, Rolf
Active solid-state devices (e.g., transistors, solid-state diode
Non-single crystal, or recrystallized, semiconductor...
Field effect device in non-single crystal, or...
257393, 257408, 257903, 257350, H01L 2978
Patent
active
052987647
ABSTRACT:
In a semiconductor device and, in particular, a semiconductor memory device in which a channel region formed in a polycrystalline film of a first channel conductivity type insulated gate field effect transistor is divided into a first channel region, which is in contact with a drain region, and a second channel region and the second channel region contains a second conductivity type impurity or a first conductivity type impurity whose density is higher than the impurity density of the first channel region, the threshold voltage can be controlled and the leakage current can be made small.
REFERENCES:
patent: 4236167 (1980-11-01), Woods
patent: 4980732 (1990-12-01), Okazawa
Hashimoto Naotaka
Hashimoto Takashi
Yamanaka Toshiaki
Hille Rolf
Hitachi , Ltd.
Limanek Robert
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