Semiconductor memory array with buried drain lines and methods t

Static information storage and retrieval – Floating gate – Particular biasing

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36518529, 36518502, 36518501, G11C 1604

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active

059869348

ABSTRACT:
A semiconductor memory array and methods therefor is provided herein comprising a substrate; a plurality of memory cell field effect transistors formed on said substrate and being arranged thereon into rows and columns of transistors, each transistor includes a channel region interposed between drain and source regions, and overlaid by a control gate region; a plurality of first diffused elongated regions formed within said substrate that electrically connect in common the drain regions of transistors in respective columns; a plurality of second diffused elongated regions formed within said substrate that electrically connect in common the source regions of transistors in respective columns; and a plurality of elongated conductive line formed over said substrate that electrically connect in common the control gate regions of transistors in respective rows.

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Sohrab Kianian et al., "A Novel 3 Volts-Only, Small Sector Erase, High Density Flash E.sup.2 PROM" 1994 Symposium on VLSI Technology Digest of Technical Papers, pp. 71-72.
Y. Ma et al., "A Novel High Density Contactless Flash Memory Array Using Split-Gate Source-Side-Injection Cell For 5V-Only Applications" 1994 Symposium on VLSI Technology Digest of Technical Papers, pp. 49-50.

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