Optics: measuring and testing – By alignment in lateral direction – With registration indicia
Patent
1994-04-25
1996-08-27
Evans, F. L.
Optics: measuring and testing
By alignment in lateral direction
With registration indicia
356375, 25055929, G01B 1100
Patent
active
055506348
ABSTRACT:
A fine alignment section positions a reference wafer for inspecting the accuracy, delivers a cutting table by an interval value between the regular patterns, and a regular pattern position on the reference wafer for inspecting the accuracy is inspected at that time. An inspecting means compares the detected value by the fine alignment section with a true pattern position on the wafer to inspect the positioning accuracy of a semiconductor manufacturing system. Furthermore, the fine alignment section positions the reference wafer for inspecting the accuracy, delivers the cutting table by an interval between irregular pattern, and detects a irregular pattern position of the reference wafer for inspecting the accuracy at that time. The inspecting means compares the detected value detected by the fine alignment section with the true pattern position on the wafer to inspect the mechanical accuracy of the semiconductor manufacturing system.
Evans F. L.
Tokyo Seimitsu Co. Ltd.
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