Boots – shoes – and leggings
Patent
1997-05-20
2000-03-14
Ruggiero, Joseph
Boots, shoes, and leggings
36446803, 364578, G06F 1900
Patent
active
060363460
ABSTRACT:
A semiconductor manufacturing process simulation apparatus using a diffusion model in which a dislocation loop generated in a crystalline substrate during an ion implantation process of a semiconductor manufacturing process is considered with respect to a diffusion in a heat treatment process subsequent to the ion implantation process. An ion implantation process simulating part simulates an ion implantation process. A model generating part generates a diffusion model in which contribution of dislocation loops is considered, the dislocation loops being formed in the substrate during the ion implantation process. A heat treatment process simulating part simulates a heat treatment process subsequent to the ion implantation process, the diffusion model generated by the model generating part being used for simulating diffusion of impurities in the substrate during the heat treatment process. A pressure field generated by the dislocation loops in the substrate is defined in the diffusion model by a function of a distance from a layer in which the dislocation loops are formed.
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Hino Takeshi
Hyodo Toshihiro
Ricoh & Company, Ltd.
Ruggiero Joseph
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