Metal treatment – Compositions – Heat treating
Patent
1976-03-29
1978-09-12
Rutledge, L. Dewayne
Metal treatment
Compositions
Heat treating
29578, 148187, 357 23, 357 24, 357 42, 357 54, 427 94, 427248B, H01L 21265, H01L 2131
Patent
active
041135156
ABSTRACT:
The invention relates to a method of manufacturing a semiconductor device in which a surface of a silicon semiconductor region covered at least partly with a silicon oxide-containing layer is subjected to a nitridation treatment forming a buried zone of a nitrogen-containing material between the silicon oxide layer and the silicon region, which zone is used in a further phase of the manufacture or in the manufactured semiconductor device.
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patent: 3771218 (1973-11-01), Langdon
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patent: 3793088 (1974-02-01), Eckton, Jr.
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patent: 3874919 (1975-04-01), Lehman
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Kooi Else
VANLierop Joseph Gijsbertus
Biren Steven R.
Oisher Jack
Rutledge L. Dewayne
Saba W. G.
Trifari Frank R.
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